Spin Cleaner - Company Ranking(3 companyies in total)

Last Updated：Aug 06, 2025 Aggregation Period:Jul 09, 2025〜Aug 05, 2025
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Company Name	Company information	Featured Products
Company Name	Company information	Product Image, Product Name, Price Range	overview	Application/Performance example
マック産業機器テクノロジーセンター	Address Saitama/ number of employees 11 Business Activities 1. Manufacturing and sales of industrial robots. 2. Manufacturing and sales of semiconductor manufacturing equipment, including semiconductor testing equipment, semiconductor inspection equipment, and semiconductor transport equipment. 3. Manufacturing and sales of liquid crystal transport equipment. 4. Manufacturing and sales of sheet-type spin cleaning equipment and spin etching equipment. 5. Manufacturing and sales of silicon wafer separators for solar cells, thin-film silicon glass etching, and glass substrate cleaning equipment for CIGS, etc. Key Partners Hitachi, Ltd. SMC Corporation Sharp Corporation Honda Engineering Co., Ltd. Honda R&D Co., Ltd. Lintec Corporation Renesas Electronics Corporation Kyocera Corporation US Mech Co., Ltd. Murata Manufacturing Co., Ltd. Fujifilm Corporation JSR Corporation Kaijo Corporation Koden Co., Ltd. Nikon Corporation Oriental Motor Co., Ltd. Canon Inc. Yamamoto Manufacturing Co., Ltd. Tohoku University Faculty of Engineering Shin-Etsu Semiconductor Co., Ltd. Imai Manufacturing Co., Ltd. National Institute of Advanced Industrial Science and Technology Iwatani Corporation Gas Network Kyushu 3D Semiconductor Research Center Sharp Takaya Electronic Industries Co., Ltd. Iwatani Corporation CMO AUO	ME500-2611 Desktop Automatic Spin Cleaning Device 1 million yen-5 million yen	This device is a tabletop automatic spin cleaner that manually sets the target workpiece and performs ultrasonic cleaning, pure water rinsing, and air blow drying through spin rotation.	Cleaning of glass substrates and wafers.
		Small Spin Cleaning Device ME-510 1 million yen-5 million yen	【Specifications】 ○ Supported rotation speed: MAX 3000rpm ○ Supported sample size: 30 to 150 square, PET film and glass ○ Brush section: Brush elevation, rotation, brush rotation, detergent supply ○ Pure water supply section: Rotation by air cylinder, pure water supply ○ Air blow: Air blow drying ○ Main body size: W650 x D800 x H710, aluminum frame ● For more details, please contact us or refer to the catalog.	For more details, please contact us or refer to the catalog.
		Alkaline-compatible spin cleaning device 1 million yen-5 million yen	Cleaning Work ● PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ● 8, 12-inch wafers compatible with various workpieces (optional) Cleaning Water ● Alkaline ● Pure water ● Hydrogen dissolved water ● Ozone water Supported Rotation Speed MAX 3000rpm Pure Water Supply Pressure 0.3Mpa or higher N2 Blow Drying N2 Blow Dry Dimensions External Dimensions W1180×D1350×H1610	●PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ●8, 12-inch wafers compatible with various workpieces (optional)
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マック産業機器テクノロジーセンター

Address

Saitama/

number of employees

11

Business Activities

1. Manufacturing and sales of industrial robots. 2. Manufacturing and sales of semiconductor manufacturing equipment, including semiconductor testing equipment, semiconductor inspection equipment, and semiconductor transport equipment. 3. Manufacturing and sales of liquid crystal transport equipment. 4. Manufacturing and sales of sheet-type spin cleaning equipment and spin etching equipment. 5. Manufacturing and sales of silicon wafer separators for solar cells, thin-film silicon glass etching, and glass substrate cleaning equipment for CIGS, etc.

Key Partners

Hitachi, Ltd. SMC Corporation Sharp Corporation Honda Engineering Co., Ltd. Honda R&D Co., Ltd. Lintec Corporation Renesas Electronics Corporation Kyocera Corporation US Mech Co., Ltd. Murata Manufacturing Co., Ltd. Fujifilm Corporation JSR Corporation Kaijo Corporation Koden Co., Ltd. Nikon Corporation Oriental Motor Co., Ltd. Canon Inc. Yamamoto Manufacturing Co., Ltd. Tohoku University Faculty of Engineering Shin-Etsu Semiconductor Co., Ltd. Imai Manufacturing Co., Ltd. National Institute of Advanced Industrial Science and Technology Iwatani Corporation Gas Network Kyushu 3D Semiconductor Research Center Sharp Takaya Electronic Industries Co., Ltd. Iwatani Corporation CMO AUO

Featured Products

ME500-2611 Desktop Automatic Spin Cleaning Device

overview

This device is a tabletop automatic spin cleaner that manually sets the target workpiece and performs ultrasonic cleaning, pure water rinsing, and air blow drying through spin rotation.

Application/Performance example

Cleaning of glass substrates and wafers.

Small Spin Cleaning Device ME-510

overview

【Specifications】 ○ Supported rotation speed: MAX 3000rpm ○ Supported sample size: 30 to 150 square, PET film and glass ○ Brush section: Brush elevation, rotation, brush rotation, detergent supply ○ Pure water supply section: Rotation by air cylinder, pure water supply ○ Air blow: Air blow drying ○ Main body size: W650 x D800 x H710, aluminum frame ● For more details, please contact us or refer to the catalog.

Application/Performance example

For more details, please contact us or refer to the catalog.

Alkaline-compatible spin cleaning device

overview

Cleaning Work ● PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ● 8, 12-inch wafers compatible with various workpieces (optional) Cleaning Water ● Alkaline ● Pure water ● Hydrogen dissolved water ● Ozone water Supported Rotation Speed MAX 3000rpm Pure Water Supply Pressure 0.3Mpa or higher N2 Blow Drying N2 Blow Dry Dimensions External Dimensions W1180×D1350×H1610

Application/Performance example

●PET film and glass substrate 50–300 square, t = 0.7, 1.1mm ●8, 12-inch wafers compatible with various workpieces (optional)
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Business Activities

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Spin Cleaner - Company Ranking(3 companyies in total)

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